| 초록 |
For last decade, PDMS has been widely used for a variety of microfluidice devices thanks to its many advantageous properties including easiness in handling, optical clearance, and cost competitiveness. The rubber-like softness of PDMS allows for the conformal adhesion on many substrate materials such as glass and Si wafers, which is critically important to fabricate microfluidic devices. However, due to the high oxygen permeability of PDMS, the PDMS-based microfluidic devices was only demonstrated limited application to photopolymerization, since oxygen is a well-known inhibitor of radical polymerization. In this work, we applied an effective oxygen barrier film on PDMS substrates coated conformally via iCVD process. The diffusion of oxygen passing through PDMS substrate was significantly reduced and photopolymerization of PEGDA was successfully achieved in PDMS microfluidic device with the minimum feature size of 4 micron. |
