| 학회 |
한국화학공학회 |
| 학술대회 |
2008년 봄 (04/23 ~ 04/25, 제주ICC) |
| 권호 |
14권 1호, p.85 |
| 발표분야 |
고분자 |
| 제목 |
Deposition of Poly[2-(perfluorooctyl)ethyl acrylate] from Liquid CO2 High Pressure Free Meniscus Coating - Uniformity and Morphology |
| 초록 |
Ultrathin fluoropolymer films were prepared by depositing poly[2-(perfluorooctyl)ethyl acrylate] (PFOEA) on 12.5 cm diameter silicon wafer substrates using high-pressure free meniscus coating (hFMC) with liquid CO2 (l-CO2) as a coating solvent. Dry film thickness across the wafer substrate and the morphology of deposited films were characterized as a function of coating conditions – withdrawal velocities, solution concentrations and evaporation driving forces (ΔP). Thickness measurements by ellipsometry revealed that at zero or low evaporation driving forces (ΔP = 0–0.0138 MPa), highly uniform films with thicknesses in the range of 7-30 nm were deposited over the entire concentration range (1–7 wt%). However, films deposited at high evaporation driving forces (ΔP = 0.0414-0.0552 MPa) or larger concentrations (5-7 wt%) with a ΔP of 0.0276 MPa were thicker (35–70 nm) and less uniform. Optical microscopy and atomic force microscopy (AFM) were used to characterize film morphology including drying defects and film roughness. Films deposited from l-CO2 hFMC were much thinner and more uniform, and exhibit much fewer drying defects and lower RMS roughness. |
| 저자 |
김재훈1, Ruben G. Carbonell2, 김재덕1
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| 소속 |
1한국과학기술(연), 2North Carolina State Univ. |
| 키워드 |
liquid carbon dioxide; free meniscus coating; poly[2-(perfluorooctyl)ethyl acrylate]; thin fluorinated film |
| E-Mail |
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| 원문파일 |
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