| 학회 |
한국고분자학회 |
| 학술대회 |
2009년 가을 (10/08 ~ 10/09, 광주과학기술원 오룡관) |
| 권호 |
34권 2호 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Spontaneous Self-Assembled Lamellar Alignment in Block Copolymer Thin Films |
| 초록 |
We introduce hierarchical self-assembly of block copolymers as a lithography-free, ultra-large-scale nanopatterning process. The hierarchical assembly was derived from two levels of spontaneous orderings. The large-scale ordering was defined by the periodic thickness modulation of a block-copolymer film, which was self-organized from the receding contact line of an evaporating block-copolymer solution upon a substrate. Its length scale was tunable over a scale of tens of micrometers by adjusting the processing parameters. The small-scale ordering corresponds to the self-assembled nanostructure of a block copolymer. |
| 저자 |
김봉훈, 정성준, 신동옥, 문형석, 황진옥, 이원준, 김지은, 김상욱
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| 소속 |
KAIST |
| 키워드 |
Block Copolymer; Self-Assembly; Nanostructure
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| E-Mail |
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