| 학회 |
한국고분자학회 |
| 학술대회 |
2014년 가을 (10/06 ~ 10/08, 제주 ICC) |
| 권호 |
39권 2호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Application of new acrylamide-based block copolymers to next generation nanolithography |
| 초록 |
we report the novel and versatile self-assembly characteristics of PDOPAM-PMMA BCPs to overcome the general limitations of conventional BCPs used for DSA. Simple solvent annealing of the BCPs on a substrate generated nano-lithographic patterns with long-range ordering and minimal defect density. The nanoscale features were readily transferred to an underlying material owing to sufficient etch selectivity between PDOPAM and PMMA under UV radiation and high RIE resistance of PDOPAM. The patterned BCPs were also used as a scaffold for reliable incorporation of various inorganic components to form diverse functional nanostructures. In particular, the neutral reaction conditions enabled fabrication of Ag nanostructures using the self-assembled nano patterns for the first time. These findings suggest that this new BCP is a universal and practical candidate for successful implementation of sub-20 nm DSA processes, which is known as next generation nanolithography. |
| 저자 |
한양규 |
| 소속 |
한양대 |
| 키워드 |
new block copolymer; morphology; nanostructure; nanolithography
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| E-Mail |
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