| 초록 |
One-dimensional structures exhibit distinct electronic, optical, chemical and thermal properties due to their large surface area and possible quantum confinement effects. The nanowires which consist of alternatively arranged metal segments are very attractive approach to find out novel functionality and phenomena. In this research, we report novel method to fabricate multiple segments nanowires through Capillary Force Lithography (CFL) combined with conventional photolithography. First, Au layer deposited on Si substrate, then simply arranged line patterns of photoresist (PR) were formed by photolithography. Then the secondary metal was deposited to plug up the PR line patterns. After PR removing, CFL is conducted on metal patterns in perpendicular direction. The width of final multisegment nanowire could be precisely controlled by varying polymer film thickness in the CFL process, because the residual polymer structure was acted as etch mask against the ion-milling process. |
