| 학회 |
한국공업화학회 |
| 학술대회 |
2007년 봄 (05/11 ~ 05/12, 계명대학교) |
| 권호 |
11권 1호 |
| 발표분야 |
고분자 |
| 제목 |
Photolithographic Cell Patterning for Tissue Engineering Application |
| 초록 |
Cell patterning is vital for organizing cells on transducers for cell-based sensing, tissue engineering and cell-based drug discovery concepts. In this paper, we have synthesized a biocompatible chemically amplified resist for cell patterning. Mouse fibroblast cells were found to be preferentially aligned and proliferated on the UV exposed regions of the resist film. |
| 저자 |
최재학1, 정찬희1, 김동기2, Ramakrishnan Ganesan3
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| 소속 |
1한국원자력(연), 2한양대, 3한국과학기술원 화학과 |
| 키워드 |
cell patterning; biocompatible; chemically amplified resist
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| E-Mail |
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