| 학회 |
한국고분자학회 |
| 학술대회 |
2013년 봄 (04/11 ~ 04/12, 대전컨벤션센터) |
| 권호 |
38권 1호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Block Copolymer Lithography Combined with Nano-Imprint for Large Area Nanopatterning |
| 초록 |
The UV assisted imprinting of photosensitive sol-gel precursor created large-area metal oxide topographic patterns with various pattern shapes in a single-step process. This straightforward approach provided very low line edge roughness and high thermal stability of the imprinted metal oxide pattern, which are greatly advantageous for further graphoepitaxial block copolymer assembly. According to the metal oxide pattern shape and depth, the orientation and lateral ordering of self-assembled cylindrical and lamellar nanodomains in block copolymer thin films could be directed in a variety of ways. The stability of the morphology was confirmed by self-consistent field theory (SCFT) calculation. |
| 저자 |
문정호, 문형석, 김주영, 진형민, 최영주, 차승근, 김상욱
|
| 소속 |
한국과학기술원 |
| 키워드 |
Block copolymer; lithography; imprint
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| E-Mail |
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