| 학회 |
한국화학공학회 |
| 학술대회 |
2012년 봄 (04/25 ~ 04/27, 제주 ICC) |
| 권호 |
18권 1호, p.871 |
| 발표분야 |
재료 |
| 제목 |
Graphene Patterning by using Polystyrene film with UV Irradiation |
| 초록 |
The patterning of graphene has received a great attention, because it is essential to be utilized practically. However, when a top–down method is employed, the excellent property of graphene is lost due to the disordered structure in the edge. Here, we introduce a direct patterned growth of graphene on poly(styrene) (PS) film via UV irradiation. Because PS is crosslinked by UV-irradiation, a selective cross-linked region is prepared on the PS film on copper foil. When the sample is heated a high temperature under 1 Torr of Ar/H2 atmosphere, only non-crosslinked regions are converted into grapheme, while cross-linked regions becomes amorphous carbon. The patterned grapheme is characterized by Raman spectroscopy, scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS). |
| 저자 |
박범진1, 박재성1, 전금혜1, 현 승1, 김광수1, 홍병희2, 김진곤1
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| 소속 |
1포항공과대, 2서울대 |
| 키워드 |
graphene; solid source; pattern
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| E-Mail |
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| 원문파일 |
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