| 초록 |
Photo patternable cyclic silsesquioxane compositions containing heptakis (2,3,6-tri-O-methyl)-β-cyclodextrin as a porogen and photo acid generator (PAG) have been prepared, with the goal of achieving a photo resist free porous low dielectric constant precursor. The composition containing triphenylsulfonium based PAG could effectively create a patterned siloxane thin film with a resolution approaching ~ 2 μm. The pore size of the film with PAG was smaller than that without PAG. Furthermore, the pore size distribution of the film with PAG was much narrower than that without PAG. This might be attributed to the disturbance effect of the agglomeration of tCD molecules through pre-vitrification of the matrix at the relatively low curing temperature. |
