| 학회 | 한국재료학회 |
| 학술대회 | 2011년 가을 (10/27 ~ 10/29, 신라대학교) |
| 권호 | 17권 2호 |
| 발표분야 | B. Nanomaterials and Processing Technology(나노소재기술) |
| 제목 | Facile fabrication of Si micropillar arrays using solution imprinting and metal-assisted electroless chemical etching of Si |
| 초록 | Abstract Solution imprinting process that does not leave any residual layer has been demonstrated as a novel patterning technique. By optimizing the processing conditions such as solution concentration, stamp geometry, and stamp backing, etc., the molding or imprinting of polymer solution on a substrate with elastomeric polydimethylsiloxane (PDMS) stamp has led to residue-less, clean patterning of polymer features. The patterning technique has been shown to be applied for the fabrication of regular array of Si micropillars through metal-assisted electroless chemical etching of Si substrate, using the patterned polymer as an etch resist. Different approaches have been tested to remove Si nanowires that were formed on non-masked area by the polymer, leaving well-ordered Si micropillar arrays intact. Possible applications of thus formed Si micropillar array will be discussed. |
| 저자 | Dahl-Young Khang1, Jung-Bae Lee2 |
| 소속 | 1Department of materials science and engineering, 2Yonsei Univ. |
| 키워드 | Solution imprinting; Metal-assisted chemical etching; Si micropillar |
