학회 |
한국고분자학회 |
학술대회 |
2013년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
권호 |
38권 2호 |
발표분야 |
고분자구조 및 물성 |
제목 |
Simultaneous Improvement of Block Copolymer Self-Assembly Kinetics and Pattern Quality by Solvothermal Annealing |
초록 |
Directed self-assembly (DSA) of block copolymers (BCPs) has been one of the promising nanofabrication methodologies for resolving the resolution limit of optical lithography. However, there are some critical challenges of high-χ BCPs because it needs long annealing time due to low chain mobility. It can also have a diffusive interface resulting from the significantly reduced χ parameter due to the solvent screening effect. In this study, we report that solvothermal annealing can be used as the simultaneously effective method for a rapid self-assembly as well as for producing sharp interfaces between two blocks. Owing to the extremely rapid self-assembly and sharp interfaces, solvothermal annealing has the advantages of high throughput and improved pattern quality. |
저자 |
김종민1, 정연식1, 정재원1, 김미정2, 백광민1
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소속 |
1한국과학기술원, 2삼성종합기술원 |
키워드 |
block copolymer; high flory-huggins parameter; kinetics; solvothermal
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E-Mail |
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