| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
37권 2호 |
| 발표분야 |
고분자가공/복합재료 |
| 제목 |
The fabrication of 10nm scale complex patterns by repetitive secondary sputtering lithography and its display applications. |
| 초록 |
The development of large-area nano-patterning with 3-dimensional structures and simple process scheme/cost is a very important work for realizing their potential applications in opto-electronics and nano-biotechnology such as nanoelectronics, optics, optical sensing, light-emitting devices and bio-sensing devices. We have developed an highly advanced nanopatterning technique by adopting secondary sputtering lithography repetitively to achieve the very complex 3-dimeansional patterns and connected 10nm scale patterns. This research work was accomplished by rotating the second patterned PDMS mold with line and ring shapes with respect to the first gold patterns. The resulting periodic structures contained various complex 3D patterns and a range of feature sizes that are difficult and time-consuming to fabricate using other methods. |
| 저자 |
전환진, 정현수, 정희태
|
| 소속 |
KAIST |
| 키워드 |
nanopattern; secondary sputtering
|
| E-Mail |
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