| 학회 |
한국공업화학회 |
| 학술대회 |
2013년 가을 (10/30 ~ 11/01, 대전컨벤션센터) |
| 권호 |
17권 2호 |
| 발표분야 |
포스터-고분자 |
| 제목 |
New Photopolymer with High Photosensitivity and Excellent Alignment Characteristics for 3D Retardation Film |
| 초록 |
Photo-alignment materials are needed to have high photosensitive properties for high productivity on the continuous roll to roll process of retardation film. Photo-alignment is efficient method for aligning liquid crystal. Especially, photoisomerization and photodimerization were well known as reasonable methods for producing FPR because those reactions are occurred at lower polarized UV energy than photodegration (3~12.7 J/cm2). In general, photodimerization of photosensitive groups in the photopolymer was used to obtain a stable alignment of low molecular weight liquid crystal (LC) molecules. New photo-alignment material containing a chalcone moiety was well synthesized. Photopolymer with chalcone group exhibited high photosensitivity and excellent LC alignment capability upon very low UV exposure energy for commercial application to 3D patterned retardation film. |
| 저자 |
강주희, 양시열, 정승용, 최경호, 신교직, 이상국
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| 소속 |
한국생산기술(연) |
| 키워드 |
Chalcone; Photo-dimerization; High photosensitivity; LC alignment; Retardation film
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| E-Mail |
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