| 학회 | 한국화학공학회 |
| 학술대회 | 2022년 봄 (04/20 ~ 04/23, 제주국제컨벤션센터) |
| 권호 | 28권 1호, p.1089 |
| 발표분야 | [주제 12] 화학공학일반(부문위원회 발표) |
| 제목 | Orientation Control of Supramolecular Dendrimer by High-Resolution Guide Patterns Based on Block Copolymer |
| 초록 | The development of nanopatterns below 5 nm is a key technology in various fields such as next-generation semiconductors. This study aims to develop a new method of bottom-up lithography with high-resolution and regular pattern of 5 nm or less using supramolecular dendrimers. A block copolymer-based bottom-up approach produces a guide pattern with a width of (<50 nm) smaller than the width of the existing pattern (>1000 nm). Using an ultra-high-resolution pattern, directed self-assembly (DSA) of supramolecular columns forms a cylindrical structure with an alignment of a hexagonal structure with a diameter of 4.75 nm. Atomic force microscopy (AFM) images revealed that the ultra-high-resolution pattern can control the orientation of the supramolecular columns parallel or perpendicular to the pattern axis. Furthermore, the dendrimers were well aligned even at a bent guide p patterns with higher curvature (<90°) than the existing guide patterns (150°). This study is expected to be a solution to large-area direction control, long-term literal orders covering the pattern area, and complex nanostructure by combining with DSA of block copolymers. |
| 저자 | 박희진1, 이원무1, 이주환2, 정희태1 |
| 소속 | 1카이스트, 2이화여자대 |
| 키워드 | 고분자(Polymer) |
| 원문파일 | 초록 보기 |
