| 학회 | 한국화학공학회 |
| 학술대회 | 2011년 가을 (10/26 ~ 10/28, 송도컨벤시아) |
| 권호 | 17권 2호, p.1386 |
| 발표분야 | 미립자공학 |
| 제목 | Preparation of TiO2/SiOx Double-Layer Films on Particlesand Its Application to NO and SO2 Removals |
| 초록 | The plasma chemical vapor deposition (PCVD) process has been widely used to prepare thin films for semiconductor fabrication and can also be used to coat thin films on particles. To coat uniformly thin film on particles, we need to make the particles stay in gas phase for some time. In the rotating cylindrical PCVD reactor, the particles will rotate together with the cylindrical PCVD reactor. The active radicals generated by the plasma will be used to coat some particles on the cylindrical tube wall and also other particles dropping in the gas phase of bulk. In this work, the TiO2/SiOx double-layer films were coated on glass beads by rotating PCVD reactor and the growth rates of thin films on particles were analyzed for various process variables. The photocatalytic activities of TiO2/SiOx double-layer films on glass beads were tested for the NO and SO2 removals. |
| 저자 | Pham Hung Cuong, 유현철, 김교선 |
| 소속 | 강원대 |
| 키워드 | particle coating; TiO2/SiOx double-layer films; rotating PCVD reactor; photocatalysts; NO and SO2 removal |
| 원문파일 | 초록 보기 |
