화학공학소재연구정보센터
학회 한국화학공학회
학술대회 2009년 봄 (04/23 ~ 04/24, 광주 김대중컨벤션센터)
권호 15권 1호, p.329
발표분야 분리기술
제목 Non-Surfactant SCCO2 Cleaning for photoresist residue on semiconductor wafer
초록 Supercritical CO2-based fluid is not only being considered as environmentally benign medium for various field as alternative solvent, but also capable of challenging feature dimensions. Despite many attractive properties such as highly integrated electronic device, pure supercritical CO2 has little solvating power for polar components. Conventional process use fluorinate surfactants. The fluorinated surfactant has many disadvantages such as environmental problem and high cost. Therefore, Non-surfactants process was studied in this work. When, amine, alcohol and hydrogen peroxide were employed, residue of photo resist can be removed. Cleaning effectiveness was significantly affected by formulation of them. Total amount of additives could be decreased.
저자 장원호, 유기풍, 김민성, 김경환
소속 서강대
키워드 SCORR
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