| 초록 |
Boron should be removed in a semiconductor process. Boron is difficult to remove thoroughly through conventional electro-deionization processes. Alternatively, the chelating adsorbent having multi-hydroxyl functional groups can remove boron effectively. Here, methacrylate-based porous beads were produced using suspension polymerization with methyl methacrylate (MMA), glycidyl methacrylate (GMA), and divinylbenzene (DVB), followed by functionalization by N-methyl-D-glucamine. The pore size and porosity were controled by varying the amount of crosslinking agent. As the amount of DVB decreased, the boron adsorption capacity increased. The boron adsorption capacity, the kinetics and the mechanical property were investigated by changing the ratio of GMA and MMA systemetically. |
