| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 봄 (04/12 ~ 04/13, 대전컨벤션센터) |
| 권호 |
37권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Large scale area nano lithography via self assembled block copolymer with photoreist pattern |
| 초록 |
These We accomplished truly scalable, low cost, arbitrarily large-area block copolymer lithography, synergistically integrating the two principles of graphoepitaxy and epitaxial self-assembly. Graphoepitaxy morphology composed of highly aligned lamellar block copolymer film that self-assembled within a disposable photoresist trench pattern was prepared by conventional I-line lithography and utilized as a chemical nanopatterning mask for the underlying substrate. After the block copolymer film and disposable photoresist layer were removed, the same lamellar block copolymer film was epitaxially assembled on the exposed chemically patterned substrate. Highly oriented lamellar morphology was attained without any trace of structure directing the photoresist pattern over an arbitrarily large area. |
| 저자 |
진형민, 정성준, 문형석, 김봉훈, 김주영, 김상욱
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| 소속 |
KAIST |
| 키워드 |
Block copolymer; self-assembly; lithography; soft graphoexpitaxy
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| E-Mail |
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