초록 |
Block copolymer (BCP) plays a significant role in fabricating nanostructure due to its self-assembly property, and it has been largely investigated. Solvent annealing is one of effective technique to induce the self-assembly of BCP in film geometry, where absorbed solvent tune the surface energy between the two blocks and the interfacial interactions at the substrates, and enhance chain mobility. In this study, thin films of lamella-forming polystyrene-block-poly(2-vinyl pyridine) (PS-b-P2VP) on modified substrates were exposed to solvent vapor. The structures of block copolymer thin films were studied using scanning force microscopy (SFM), Scanning Electron Microscopy (SEM) and Grazing Incidence small-angle X-ray scattering (GISAXS). |