화학공학소재연구정보센터
학회 한국화학공학회
학술대회 2005년 봄 (04/22 ~ 04/23, 여수대학교)
권호 11권 1호, p.868
발표분야 재료
제목 Effects of thermal and H2 plasma treatments on the structural and optical properties of amorphous carbon nitride films grown by PECVD
초록 The carbon nitride films which have excellent mechanical properties would be similar to the crystalline diamond, or more. In this study, the amorphous carbon nitride (a-CNx) films, fabricated by plasma enhanced chemical vapor deposition (PECVD), were treated by H2 plasmas and thermal annealing. The effect of thermal and H2 plasma treatments changed the film thickness, composition, structure, and optical properties, which were investigated by FT-IR, XRD, AFM, PL. and electrophotometer. Various C and N bonds have been observed in the a-CNx films by FT-IR, such as C-N, C=N, and C≡N. The energy of adatoms in the films was increased by thermal and H2 plasma treatment. So, the adatoms were migrated in the films and changed the film structures. The FT-IR spectra and reflectivity of the films were also changed by the rearranged and reconstructed film structures, and they were confirmed by XRD peak positions. The PL spectra were decreased with increasing the annealing temperature and the plasma source power, but it contained same energy and three emission peaks.
저자 김상훈, 옥치원, 한윤봉
소속 전북대
키워드 carbon nitride; RTCVD; PECVD
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