| 초록 |
The plasma polymer films were deposited from hexamethyldisiloxane (HMDSO) on polyethylene terephthalate (PET) under different operating conditions such as r. f. power ranging from 50W to 400W as well as at different HMDSO/O2 flow ratio. From the surface profilometer and AFM study, the highest deposition rate 38.88 nm/min was found when the substrate was treated for 15 min at r. f. of 200W and HMDSO/O2 flow were 1gm/hr and 12 sccm respectively and the roughness was increased when the samples were treated for a longer time. From FT-IR data, the Si-O-Si bending peak at (820-800) cm-1, the strong Si-O-Si stretching absorption band at (1150-1000) cm-1, the symmetric bending in Si-CH3 at (1270-1260) cm-1 were found but the Si-CH3 bending peak were not found in the spectra for r. f. of 300W and 400W because high plasma power decrease the carbon content and increase the inorganic character. The contact angles were decreased when the r. f. power increased. |
