| 학회 |
한국화학공학회 |
| 학술대회 |
2017년 봄 (04/26 ~ 04/28, ICC 제주) |
| 권호 |
23권 1호, p.9 |
| 발표분야 |
고분자 |
| 제목 |
Robust Superomniphobic Surfaces featured by Localized Photofluidization of Azopolymer Pillars |
| 초록 |
Springtails possess robust omniphobic skins with nanotextures with a doubly re-entrant geometry. Although omniphobic surfaces are promising for various applications, it remains an important challenge to mimic the structural feature of springtails. This paper presents a pragmatic method to create doubly re-entrant microstructures and robust super-omniphobic surfaces by exploiting localized photofluidization of azopolymers. Irradiation of circularly-polarized light reconfigures azopolymer micropillars to have a mushroom-like head with a doubly re-entrant geometry through protrusion and inward bending of polymer film from the top edge; this geometry is otherwise very difficult to produce. The unique geometry exhibits super-omniphobicity even for liquids whose equilibrium contact angles are almost zero in the presence of a practical level of external pressure. The simple fabrication process is highly reproducible, scalable, and compatible with various substrate materials. Our results suggest that our photofluidization technology will provide a practical route to create robust super-omniphobic surfaces.
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| 저자 |
최재호, 조원희, 이승열, 정연식, 김신현, 김희탁
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| 소속 |
KAIST |
| 키워드 |
기능성고분자 |
| E-Mail |
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| 원문파일 |
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