| 학회 |
한국화학공학회 |
| 학술대회 |
2017년 봄 (04/26 ~ 04/28, ICC 제주) |
| 권호 |
23권 1호, p.8 |
| 발표분야 |
고분자 |
| 제목 |
Perpendicular alignment of symmetric diblock copolymer thin film controlled by the grafting density of random copolymer brush |
| 초록 |
We investigated the effect of grafting density of random copolymer (r-CP) brush to induce a perpendicular orientation of block copolymer (BCP) thin film. In order to fabricate nanopatterns through BCP self-assembly, it is important to arrange the BCP microdomains perpendicular to the substrate. Among various techniques to induce perpendicular microdomains, we utilized a simple and feasible method of grafting random copolymer P(S-r-MMA) brush chains to the silicon oxide substrate to achieve the balanced interfacial interaction between the substrate and each block of PS-b-PMMA. In this study, the effect of random copolymer grafting density (σ) was thoroughly assessed by delicately manipulating the grafting reaction rate between the end-functional hydroxyl group (-OH) of r-CP brush. The thickness window for perpendicular alignment was evaluated by means of scanning force microscopy (SFM) and grazing incidence small angle x-ray scattering (GISAXS) analysis and the results were reconfirmed by single chain mean field (SCMF) simulations. |
| 저자 |
이우섭1, 류두열1, 박성민1, 김영식1, Vaidyanathan Sethuraman2, Nathan Rebello2, Venkat Ganesan2
|
| 소속 |
1연세대, 2Univ. of Texas at Austin |
| 키워드 |
고분자물성 |
| E-Mail |
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| VOD |
VOD 보기 |
| 원문파일 |
초록 보기 |
