| 초록 |
Nanoimprint lithography(NIL) is one of the promising techniques due to its low cost, simple process, and great precision for various applications. Photocurable materials based on siloxanes and phosphorus compounds were synthesized for 100 nm level NIL because of their potential pattern-forming property and etching resistance. To satisfy various requirements for NIL applications, photocurable mixtures were prepared by incorporating various acrylic additives into the siloxanes or phosphorus based compounds. The formulations containing organic-inorganic hybrid materials showed high-throughput, good release property, low volumetric shrinkage, and low surface energy. The synthesized materials were confirmed by H-NMR or P-NMR and their photocuring behaviors and NIL pattern properties were characterized by photo DSC, SEM and AFM. |
