화학공학소재연구정보센터
학회 한국재료학회
학술대회 2010년 가을 (11/11 ~ 11/12, 무주리조트)
권호 16권 2호
발표분야 B. Nano materials and processing Technology(나노소재기술)
제목 Applications of nanopatterns made on different substrates using block copolymer (PS-b-PMMA)
초록 High density arrays of nanostructures over large area can be formed by self-assembly of block copolymers on a variety of substrates such as silica deposited silicon wafer, glass, GaN etc. Spin coating fallowed by baking the polymer solution onto the substrate self assembles the components of the polymer. PS and PMMA have significantly different photodegradation properties. Exposure to ultraviolet radiation degrades the PMMA (polymethyl methacrylate) chain that can be removed by rinsing in acetic acid giving patterned holes. The deposition of a gold thin film on polymer-patterned glass followed by the removal of the remaining part of the polymer results in patterned gold on glass, which can be used as a transparent conducting electrode, where the conductivity and transparency depends on the thickness of gold and as well as on the connectivity of the gold pattern. Similarly, the polymer pattern can be transferred to an underlying GaN layer in an as grown LED, which increases the photoluminescence intensity making it useful as a photonic crystal. The morphology of the polymer film surface was studied using atomic force microscopy (AFM) and scanning electron microscopy (SEM).
저자 Md. Mahbub Alam, Woo-Gwang Jung, Yu-Rim Lee, Jin-Yeol Kim
소속 국민대
키워드 nanopattern; block copolymer; PS; PMMA; photonic crystal
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