| 학회 | 한국재료학회 |
| 학술대회 | 2016년 봄 (05/18 ~ 05/20, 여수 디오션리조트 ) |
| 권호 | 22권 1호 |
| 발표분야 | G. 나노/박막 재료 분과 |
| 제목 | Atomic Layer Deposition-assisted Hybrid Processes for improved Material properties |
| 초록 | Atomic layer deposition (ALD) is considered as one of the most promising thin film deposition techniques for nanoscience and nanoengineering. The benefits of ALD include thickness control at the atomic scale, production of highly conformal films, low temperature growth, and wide-area uniformity. Due to these benefits, ALD has been adopted as a key technology for the semiconductor microelectronics industries. Also, ALD is now expanding its applications to other industries by developing new materials and/or processes. Herein, we will introduce some examples of ALD based hybrid processes which can be useful method to improve material properties. Examples include the development of highly corrosion resistive materials for the protection against harsh environments as well as the fabrication of highly ordered nanostructures. |
| 저자 | Se-Hun Kwon1, Woo Jae Lee1, Sung Kyu Ahn2, Jung Dae Kwon3 |
| 소속 | 1School of Materials Science and Engineering, 2Ulsan Technopark, 3Korea Insisute of Materials Science |
| 키워드 | ALD; Hybrid Process; corrosion properties |
