| 학회 |
한국재료학회 |
| 학술대회 |
2009년 봄 (05/21 ~ 05/22, 무주리조트) |
| 권호 |
15권 1호 |
| 발표분야 |
반도체재료 |
| 제목 |
Crystalline Cr2O3 thin films growth by using RF magnetron sputtering at room temperature |
| 초록 |
In this presentation, we produced relatively good crystalline quality α-Cr2O3 (0001) thin films on α-Al2O3 (0001) substrate by using RF magnetron sputtering at room temperature and simple Rapid Thermal Annealing (RTA) treatment. First, oxygen-rich Chromium Oxide thin films were deposited with various gas flow ratios of argon and oxygen. Subsequently, RTA treatment was carried out on as-deposited films and then changed to stoichiometric α-Cr2O3 (0001) films with significantly improved crystallinty. We found the optimum gas flow ratio of argon and oxygen for RF magnetron sputtering and the best gas atmosphere for RTA treatment. To investigate the crystallinity, chemical properties and the surface morphology of Chromium Oxide thin films, X-ray Diffraction (XRD) θ-2θ scans, rocking curve analysis and Փ-scans, X-ray Photoelectron Spectroscopy(XPS), Scanning Electron Microscope(SEM), and Atomic Force Microscope(AFM) were performed. |
| 저자 |
정상용1, 이진복1, 전준우1, 이상민1, 나현석2, 성태연1
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| 소속 |
1고려대, 2대진대 |
| 키워드 |
Cr2O3; thin films; sputtering
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| E-Mail |
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