| 초록 |
Atomic Layer Deposition(ALD) has recently been applied to the anode, cathode, and solid electrolyte of the lithium-ion batteries(LIBs) to improve the stability of the electrode-electrolyte interface. For a successful ALD process, it is important to evaluate the volatility and thermal stability of the precursor. In particular, since the decomposition of the precursor is related to the changes in the properties of thin-film, thermal stability must be evaluated. In this study, the thermal stability of the Zr precursor was evaluated using a new apparatus capable of heating and sampling precursors in a vacuum environment. The reliability of the evaluation was improved compared to previous studies by using a new method. Thus, this study is expected to provide useful information for the development of ALD precursors and process optimization used in LIBs. |
