| 학회 |
한국재료학회 |
| 학술대회 |
2020년 가을 (11/18 ~ 11/20, 휘닉스 제주 섭지코지) |
| 권호 |
26권 1호 |
| 발표분야 |
G. 나노/박막 재료 분과 |
| 제목 |
Area-Selective Atomic Layer Deposition Assisted by Short-Chain Alkanethiols Self-Assembled Monolayers |
| 초록 |
As the sizes of transistor device in integrated circuits continue downward scaling, nanoscale patterning of materials is widely employed in the 2D or 3D metal-dielectric patterns. Area-selective atomic layer deposition (AS-ALD) is the emerging “bottom-up” technique to create nanoscale features. Self-assembled monolayers (SAMs) have been selectively applied as blocking agents to achieve AS-ALD depending on the surface properties of substrates followed by selective ALD growth on the active surface areas not covered with the blocking agent. In this work, we introduce AS-ALD on metal-dielectric patterned structures by passivating metal surfaces using three kinds of alkanethiols SAMs having different alkane chain length. More specifically, we employ vapor-phase selective chemisorption of 1-Dodecanethiol, 1-Hexanethiol and 1-Propanethiol working as surface-inhibitory SAMs only on metal substrates (e.g. Cu, W and TiN) over SiO2 surfaces. Then either dielectric materials (e.g. SiO2) ALD or metal (e.g. Ru) ALD is successfully deposited only on the SiO2 surfaces. Thereby, we confirm that both 1-Propanethiol and 1-Hexanethiol with short-chain alkane can also provide good blocking ability against ALD processes compared to other bulky SAMs with relatively long chain length such as 1-Dodecanethiol. In addition, we can further enhance selectivity against ALD processes by applying discrete feeding method, which the SAM feeding/purge step is divided into several shorter feeding/purge steps but keeping up an identical total feeding/purge time. Discrete feeding method would suggest the feasibility of new nanoscale patterning technology in next generation electronic devices. |
| 저자 |
Jeongbin Lee1, Jinseon Lee2, Jeong-Min Lee1, Tae Joo Park2, Woohee Kim1
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| 소속 |
1Department of Materials Science and Chemical Engineering, 2Hanyang Univ. |
| 키워드 |
area-selective atomic layer deposition; self-assembled monolayers; short-chain alkanethiols; chemisorption; patterned device
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| E-Mail |
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