| 초록 |
For the integrations and miniaturizations in electronic device, current interest in nanotechnology is focused on the state-of-the-art lithographic development due to the physical limitation of the photolithography. Atomic force microscopy (AFM) anodization lithography is considered as one of several novel lithographic techniques to fabricate nanostructures. AFM anodization lithography produces oxide patterns protruded on a substrate by faradaic current from the cathode tip to the anode substrate. In this presentation, the lithographic tendency with the change of metal substrates, applied voltages, lithographic speeds, organic thin films as resist materials, etc will be discussed in all its aspects. |
