| 학회 |
한국고분자학회 |
| 학술대회 |
2021년 봄 (04/07 ~ 04/09, 대전컨벤션센터) |
| 권호 |
46권 1호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Physically Adsorbed Block Copolymers as Neutral Layers |
| 초록 |
A physically adsorbed layer of PS-b-PMMA can effectively act as an excellent neutral layer towards the overlying PS-b-PMMA film which is completely identical to itself. The surface neutrality is valid when the correlation length (ξ) of the adsorbed layer is shorter that the domain spacing (L0) of the BCP. Subsequently, we proved that this approach can also be applied in the case of high-χ PS-b-P2VP. Based on the order-to-disorder transition behavior of the overlying PS-b-P2VP film, surface neutrality provided by the physically adsorbed PS-b-P2VP layer with its optimal thickness was even better than that of the adsorbed P(S-r-2VP) random copolymers. Our strategy enables the preparation of a high-quality neutral layer for BCP nanopatterning without any necessity of the specially designed random copolymer mats or brushes. |
| 저자 |
류두열1, 이우섭1, 김영식1, 조승연1, 안형주2
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| 소속 |
1연세대, 2포항가속기(연) |
| 키워드 |
Polymer adsorption; Block copolymer films; Neutral layers
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| E-Mail |
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