| 학회 |
한국고분자학회 |
| 학술대회 |
2017년 봄 (04/05 ~ 04/07, 대전컨벤션센터) |
| 권호 |
42권 1호 |
| 발표분야 |
대학원생 구두발표 (영어발표, 발표15분) |
| 제목 |
iCVD/ALD Single-chamber system and its application to thin film encapsulation |
| 초록 |
Single-chamber deposition system capable of depositing both organic and inorganic layers by initiated chemical vapor deposition (iCVD) and atomic layer deposition (ALD) processes was developed. The films deposited via the single-chamber were equivalent to those deposited in separate iCVD and ALD systems. The integrated system permits a simple alternation between the deposition processes to produce organic/inorganic multilayers without breaking vacuum. The fabricated multilayers demonstrated outstanding barrier performance; an estimated water vapor transmission rate (WVTR) as low as 3.7 × 10-6 g m-2 day-1 and lag time of 22,500 hours under ambient condition. They were highly transparent, and the flexibility could be significantly enhanced to endure 10 r bending with structural optimization. With further improvement, the iCVD/ALD single-chamber system is expected to be a promising approach for the encapsulation of organic electronic devices. |
| 저자 |
김봉준, 박홍근, 성혜정, 이영일, 심현정, 임성갑
|
| 소속 |
KAIST |
| 키워드 |
iCVD; ALD; Thin film encapsulation; Water vapor transmission rate
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| E-Mail |
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