| 학회 |
한국화학공학회 |
| 학술대회 |
2013년 가을 (10/23 ~ 10/25, 대구 EXCO) |
| 권호 |
19권 2호, p.1205 |
| 발표분야 |
고분자 |
| 제목 |
Fabrication of Large-area 20nm Nano-gap Electrodes for Realizing Various Applications |
| 초록 |
Nano-gap electrodes separated from the molecular scale to the nanometer scale are fundamental building blocks for the fabrication of devices and circuits. Recently, large-area nano-gap electrodes fabrication for single molecules, including diodes, transistors, switches, and memory, has been central technical challenge for the device miniaturization. We report a new nanofabrication method for realizing large-area 20nm nano-gap electrode arrays with high efficiency and reproducibility. This method is the combination with chemical etching and an innovative technique called by secondary sputtering lithography. And this large-area nano-gap electrodes in a precise and controllable manner are fully compatible with previous nano-gap fabrication technology. |
| 저자 |
김명량1, 전환진2, 김종선2, 장성우2, 정희태2
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| 소속 |
1카이스트, 2KAIST |
| 키워드 |
Nano-gap; Nanofabrication; Secondary Sputtering Lithography
|
| E-Mail |
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| 원문파일 |
초록 보기 |
