화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2002년 봄 (04/12 ~ 04/13, 서울대학교)
권호 27권 1호, p.71
발표분야 특별 심포지엄
제목 Nanoporous Polysilsesquioxane Copolymer Thin Films for Low Dielectric Applications
초록 Processible polysilsesquioxanes (PSSQs), (RSiO1.5)x, were synthesized via terpolymerization of methyltrifunctional monomer, methyltrimethoxysilane (MTMS) with bridged hexafunctional comonomer, 1,2-bistrimethoxysilylethan (BTMSE) and difunctional comonomer, dimethoxydimethylsilane (DMDMS) to investigate the optimum molecular structure and the applicability of nanoporous materials for low dielectric constant (k) applications. The results showed that bridged comonomer, BTMSE, plays a key role as it significantly improves the modulus and the hardness over those of poly(methylsilsesquioxane) homopolymer. In addition, the crack resistance is also substantially enhanced. Moreover, nanoporous films were produced from hybrid structures of PSSQ precursor and thermally labile organic pore generators. All the final films were defect-free and produced high-optical quality after final curing to 450oC, with porosities close to 50 % and pore sizes smaller than 10 nm. The dielectric constant was decreased down to 1.5, a minimum value reported so far for mechanically tough nanoporous films.

저자 노현욱1, 김형은2, 김진범3, 민성규*, 김운천, 주상현**, 이진규, 이희우*, 차국헌**, 윤도영
소속 1서울대, 2*서강대, 3**서울대
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