화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2010년 봄 (05/13 ~ 05/14, BEXCO(부산))
권호 14권 1호
발표분야 정보전자소재
제목 Control of Diffusion Coefficient through Architecture of Pore Structures in the Low-k Films
초록 Three kinds of porous silsesquioxane-based thin films with different pore structures and porosities were prepared in order to investigate the relationship between the behaviors of wet chemical diffusion and pore structure. The first model of the films contains only partially interconnected small mesopores, the second includes fully interconnected large mesopores and the last porous film model embeds isolated macropores. The diffusion coefficient of the porous films was dependent not only on porosity but also significantly on the pore structure such as pore size and pore interconnectivity.
저자 김도헌, 임진형
소속 공주대
키워드 low-k; porous; film
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