| 초록 |
In semiconductor manufacturing process PFCs(PerFluoroCompounds) are used for cleaning or printing electronic circuit boards, CVD,and dry etching etc. PFCs are extremely stable compounds with unique physical and chemical properties. Due to their chemical stability, strong absorption in the radioactively important window of IR region and long atmospheric lifetime, PFCs have high GWP (Global Worming Potential) ;about 6,500∼9,200 times larger than of CO2. There are many approaches to reduce :(1)recovery/recycle (2) abatement/destruction (3)replacement of PFCs with non-PFCs (4)process optimization etc. Because of cost efficient ways and high removal efficiency at low concentration, adsorption is useful method of PFCs separation. Therefore we are concerned with adsorption properties of CF4 and C2F6. Adsorption amounts of CF4 and C2F6 on activated carbon 20∼40 mesh were measured experimentally using volumetric method at 293K, 303K, 313K, 323K, and 333K in pressure range up to 3 psia. Experimental data were fitted to Langmuir isotherm, and the various adsorption models were compared. |
