| 초록 |
Block copolymer lithography may generate device-oriented nanostructures through parallel processing. However, it has been mostly applied to silicon based materials so far. We present universal block copolymer lithography for a broad spectrum of materials including metals, semiconductors, ceramics, and polymers. Combining advanced film deposition techniques with block copolymer nanotemplates yielded the nanopatterned films of the various functional materials. The low surface roughness and sufficient surface functionality of the target functional materials were crucial for wellordered nanostructured morphology |
