| 초록 |
The wall-number-selective growth of vertical carbon nanotube (CNT) arrays is achieved by combining plasma enhanced chemical vapor deposition (PECVD) and block copolymer lithography. Block copolymer lithography is an attractive nanopatterning method for generating a uniform catalyst particle array for carbon nanotube growth. However, the scale of the catalyst particles patterned by block copolymer lithography is usually tens of nanometers, which is too large for wall-number-selective growth of CNTs. In this work, sub-nanometer-scale tunability of catalyst size have been investigated to enable excellent controllability of the wall-number and diameter of the CNTs. Highly uniform nanopatterned iron catalyst arrays were prepared by tilted deposition through block copolymer nanotemplates.. PECVD growth of CNTs from the nanopatterned catalysts in an NH3 environment generated vertical N-doped CNTs with a fine tunability of their carbon wall numbers. |
