| 학회 |
한국고분자학회 |
| 학술대회 |
2002년 가을 (10/11 ~ 10/12, 군산대학교) |
| 권호 |
27권 2호, p.201 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
A New Fabrication Method of Antireflection Layer Using Nano Structured Surface Relief Gratings on Azobenzene Polymer Films |
| 초록 |
In this work, we report the reduction of surface reflection losses on azobenzene containing polymer films by fabricating an antireflection (AR) structure with subwavelength motheye surface patterns in the substrate. The motheye AR patterning works by creating a region of gradually varying effective refractive index between air and the azobenzene polymer layer. Motheye structures were created by exposing to the interference patterns of Argon ion laser beams and subsequent corona poling on the surface of the azobenzene polymer films. The photo-fabricated motheye structures were confirmed by measuring the AFM images and the antireflection effect was characterized.
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| 저자 |
유성종, 염준호, 김미정, 이동기, 성영은, 김동유
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| 소속 |
광주과학기술원 신소재공학과 |
| 키워드 |
antireflection layer; surface relief grating; azobenzene polymer
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| E-Mail |
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