| 초록 |
Block copolymers naturally form nanometer scale structures which repeat their geometry on a larger scale. Such a small scale periodic pattern can be used for various applications such as storage media, nano-circuits and optical filters. However, the nanostructures are easily infected by topological defects which sneak in due to entropic fluctuation and incomplete annealing: i. e. once kinetically trapped, it is extremely difficult to remove all the defects. One of the main reasons is that the defect finds a locally metastable morphology whose potential depth is large enough to prohibit further morphology evolution. In this work, the domain boundaries between differently oriented lamellar structures are studied. For the first time, it became possible to quantitatively study the block copolymer morphology in the transitional region. This theoretical method successfully analyzed the domain boundaries experimentally observed on patterned substrates [Nano Letters, 2010, 10, 3500]. |
