| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 봄 (04/10 ~ 04/11, 컨벤션 뷰로(대전)) |
| 권호 |
33권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Plasma Enhanced Chemical Vapor Deposited Silicon Oxide Gas Barrier Coatings on Polymeric Substrate Films |
| 초록 |
Silicon oxide barrier coatings fabricated by PECVD on polymeric substrate film have demonstrated impressive properties as a barrier to water vapor permeation. The plasma polymer films were deposited from HMDSO on PET and PEN under different operating conditions such as RF power ranging from 100 W to 300 W as well as at different HMDSO/O2 flow ratio. The multilayer effect of SiOx coatings on WVTR was studied to get a lowest value. The WVTR of untreated PET is 9.45 g/ m2 day. It was found that the WVTR was decreased to very low value after developing SiOx coatings on the film comparing to untreated film. From FT-IR data, the Si-O-Si bending peak at (820-800) cm-1, the strong Si-O-Si stretching absorption band at (1150-1000) cm-1, the symmetric bending in Si-CH3 at (1270-1260) cm-1 were found but the Si-CH3 bending peak was not found in the spectra for high RF power. |
| 저자 |
Choudhury Moinul Haque, 김원호, 서동범, 김성룡
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| 소속 |
충주대 |
| 키워드 |
plasma enhanced chemical vapor deposition (PECVD); gas barrier; silicon oxide
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| E-Mail |
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