| 초록 |
In this study, CF4 plasma surface treatment is performed on commercial TiO2 to improve a photocatalytic efficiency. The effect of CF4 plasma treatment on the photodegradation of rhodamine B was investigated under UV light irradiation. The samples are characterized using various methods, such as X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and Diffuse reflectance spectroscopy (DRS). The photodegradation efficiency of TiO2 is significantly increased from 37.1% to 94.4% in 120 min via CF4 plasma treatment of TiO2. In addition, TiO2 treated with CF4 plasma exhibits a photodegradation rate constant of 0.0236 min-1, which is 5.75 times higher than that of TiO2(0.0041 min-1). It is, thus, determined that CF4 plasma treatment effectively improves the photocatalytic effect of TiO2. The enhanced photocatalytic activity is attributed to the narrow band gap energy of TiO2 treated with CF4 plasma. |
