| 학회 |
한국고분자학회 |
| 학술대회 |
2015년 봄 (04/08 ~ 04/10, 대전컨벤션센터) |
| 권호 |
40권 1호 |
| 발표분야 |
분자전자 부문위원회 II |
| 제목 |
Water vapor barriers on polyethylene naphthalate using SiOx and ZnO plasma enhanced chemical vapor deposition |
| 초록 |
Thin films of SiOx and ZnO were grown by plasma-enhanced chemical vapor deposition (PECVD) and their water vapor transmission rates (WVTR) were tested either individually or as composite films on polyethylene naphthalate (PEN) substrate. Hexamethyldisiloxane and diethylzinc was used as precursors, and oxygen was used as reactive gas. The deposition rate, X-ray diffraction, surface roughness, light transmission, and WVTR of thin films were characterized as a function of the equivalence ratio and substrate temperature. Significant improvements resulted when the ZnO PECVD film was used as interlayer between SiOx layers. The water vapor transmission rates of single layer ZnO on PEN substrate was ~ 6.0 g/m2/day but that of the multi-layered structure of SiOx/ZnO/SiOx/PEN system reduced to less than 0.10 g/m2/day. The decrease in the water vapor permeability for the composite thin layers of SiOx and ZnO was attributed to water absorbing property of ZnO film. |
| 저자 |
김정용1, 송준용2, 이희진2, 최원국3, 김성룡2
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| 소속 |
1나노고분자공학과, 2한국교통대, 3한국과학기술원 |
| 키워드 |
ZnO film; water vapor transmission rates; PECVD
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| E-Mail |
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