| 초록 |
SiOx and ZnO thin films were deposited on polyethylene naphthalate (PEN) by plasma enhanced chemical vapor deposition (PECVD). Diethyl zinc and hexamethyl disiloxane (HMDSO) were used as the precursors for the preparation of ZnO and SiOx films, respectively. The permeation property and surface morphology of the films were investigated using Mocon® tester and scanning electron microscope. Multi-layer oxide films were efficient for bloking water vapor transmission. WVTR of SiOx/ZnO/SiOx multi layer film on PEN substrate was found to be < 10-3 g/m2/day with thickness of about 1 μm. Water vapor permeation rate was significantly related to crack at filim surface ans the adhesion between coating layer and polymer substrate under the being loads. Water vapor trasmission rate was increased with the number of bending cycles at a bending radious of 30 mm. Transmittance of SiOx/ZnO/SiOx multi layer film was about 75 % at 550 nm. |
