| 학회 |
한국재료학회 |
| 학술대회 |
2017년 봄 (05/17 ~ 05/19, 목포 현대호텔) |
| 권호 |
23권 1호 |
| 발표분야 |
5. 나노공정과 메타물질(Nano-fabrication and meta-materials) |
| 제목 |
Morphological transition of high-χ block copolymers by employing a combined annealing method |
| 초록 |
Directed self-assembly (DSA) of block copolymers (BCPs) with high Flory–Huggins parameter (χ) has attracted much attention because it can effectively form highly-ordered nanoscale patterns, showing various morphologies such as spheres, cylinders, perforated lamellae, and lamellae. However, there are several issues to be solved to realize more rapid and tunable pattern formation of high-χ BCPs for next-generation lithography. Here, we introduce a simple and novel annealing technique to induce morphological transition of sphere-forming poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) BCPs using a combined annealing process of solvothermal annealing (STA) and immersion annealing (IA). By using the synergetic effects of the combined annealing, we successfully obtained a well-ordered 12-nm-line pattern from 18-nm-dot structure for a short annealing time (＜ 10 min). We systematically analyzed how the swelling and non-swelling solvents affect the self-assembly kinetics and morphology of high-χ BCPs. In addition, we display how the repeated annealing of STA and IA affect the ordering stability of morphology-tuned BCPs, showing highly-ordered line and dot nanostructures after 20 cycles of repeated annealing. We suggest that these results provide a new guideline to effectively manipulate BCP nanostructures for more useful BCP controllability. |
| 저자 |
최영중, 박태완, 윤지선, 정영훈, 백종후, 조정호, 박운익
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| 소속 |
한국세라믹기술원 전자소재부품센터 |
| 키워드 |
block copolymer; directed self-assembly; morphological transition; solvothermal annealing; immersion annealing
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| E-Mail |
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