| 초록 |
Transparent conducting electrodes are critical component of optoelectronic devices including flat panel displays, touch screen displays, solar cell, and organic light-emitting diodes (OLED). Although indium tin oxide (ITO) is commonly used for this purpose, the expensive deposition process of ITO and the incompatibility with flexible electronics, due to the brittleness of thick films, prohibit their use in roll-to-roll processes. Great efforts have been attempted to realize the development of ITO alternatives for next-generation electronics. These include metal nanowire networks prepared by metal evaporation on various substrates. Although vacuum processes allow to deposit high quality materials, they are complicated, time consuming, expensive and difficult to comply with roll-to-roll processes. Here, we present simple, low-cost and scalable routes to developing flexible transparent electrodes with a low sheet resistance Rs ＜ 1 Ω sq-1 and a high transmittance T ＞ 90 % at 550nm. Metal mesh patterns were fabricated by combination of infiltration of metal flakes and electroless copper plating on poly(dimethylsiloxane) (PDMS) mold with 5 ~ 10 m wide and 8 m deep trench. A sheet resistance and transmittance of transparent conducting electrode were precisely controlled by varying line width and line spacing of copper mesh patterns. This strategy offers promising candidates to replace ITO due to the high electrical conductivity and low-cost of copper and further provides high availability and scalability for future wearable applications. |
