| 초록 |
Development of a practical alternative to indium tin oxide (ITO) has been the significant hurdle for realizing wearable optoelectronics. Here, we present a new substrate-embedded highly tall (~350nm) and thin (~30nm) three-dimensional (3D) metal grid transparent electrode which exhibits excellent optoelectronic performance (Sheet resistance of 9.8Ω/□ at the transmittance of 85.2%), high stretchability (no significant change in resistance ＜ applied strain of 15%), high density of metal mesh (＜ open space of 1µm), flat surface, no haze, and strong substrate adhesion on the polymer substrate. It is important to note that our approach satisfy most of essential requirements of transparent electrode for practical application in future electronics, all of which features arise from advantages of substrate-embedded unique 3D structure. For demonstration of practical suitability, our transparent electrode is successfully applied in flexible touch screen panel. We believe that our approach opens up opportunity for practical application in wearable electronics.
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