| 학회 |
한국고분자학회 |
| 학술대회 |
2002년 가을 (10/11 ~ 10/12, 군산대학교) |
| 권호 |
27권 2호, p.223 |
| 발표분야 |
특별 심포지엄 |
| 제목 |
Facile modifications of polyimide via chloromethylation (III): Synthesis and characterization of photosensitive polyimide methylene acrylate for optical applications |
| 초록 |
Photosensitive polyimides (PSPIs) have attracted much attention since simpler processing steps are required to produce good structures on substrate compared with conventional polyimides. The objective of this research was to prepare novel negative-type soluble photosensitive polyimides via chloromethylation for optical applications. The final polyimides bearing photoreactive ester group were obtained by the reaction of chloromethylated polyimide with acrylic acid. The structure of polyimide methylene acrylate (PIMA) was characterized by spectroscopic methods, such as 1H-NMR, FT-IR. By DSC and TGA, the thermal properties of polyimide methylene acrylates having different methylene acrylate contents were investigated. The resulting polyimide was soluble in common organic solvents such as THF and CHCl3, and solution-castable into highly transparent films. Upon the UV irradiation, photochemical crosslinking was observed and preliminary line-and-space patterning results were demonstrated. |
| 저자 |
Zhenxin Zhong, Xiangdan Li, 한상훈, 이명훈
|
| 소속 |
전북대 |
| 키워드 |
Photosensitive Polyimide; Chloromethylation
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| E-Mail |
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