| 학회 |
한국재료학회 |
| 학술대회 |
2011년 가을 (10/27 ~ 10/29, 신라대학교) |
| 권호 |
17권 2호 |
| 발표분야 |
F. Display and optic Materials and processing(디스플레이 및 광재료) |
| 제목 |
The Development of the Glass on Borosilicate System for LCD Application |
| 초록 |
A lot of energy consuming is needed to manufacture TFT-substrate glass used in the present LCD industry due to high melting temperature. Thus, it has been left a challenge in LCD industry to develop new substrate glass composition. To obtain low melting temperature substrate glass based on borosilicate system for LCD application, the parent glass compositions are consisted dominantly of B2O3 and SiO2 as glass network formers and BaO, CaO are added to obtain the proper CTE including ZrO2 and Al2O3 for ensuring the chemical durability of glass. The thoroughly mixed batches were melted between 1,450~1,550oC in a super kanthal furnace. The CTE and glass transition temperature (Tg) were measured by a thermal mechanical analyzer (TMA). The transmittance was measured by UV/VIS/NIR spectrophotometer. The CTE of the LCD glass was 38.5×10-7/K which was about 17% lower compared to Corning 7059 and thermal shrinkage was 17.33 ppm. Transmittance of LCD glass was about 90% at visible range (370~700 nm). The 3-point bending strength was about 150 MPa. The results support that these glasses would be suitable as a new glass substrate for LCD application. |
| 저자 |
Kangil Pyeon1, Se-Young Choi2
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| 소속 |
1Department of Materials Science and Engineering, 2Yonsei Univ. |
| 키워드 |
Borosilicate; LCD; Glass; TMA; Transmittance
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| E-Mail |
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