| 초록 |
For photolithography to organic electronic devices, semi-perfluoro Calixarene molecules and 1,8 naphthalic anhydride based photoacidegenater (PAG) are one of excellent materials to introduce orthogonal photolithography. The concept of orthogonal patterning is to use fluorous solvent(eg. Hydrogen Fluoro Ether series) as casting, developing, stripping to photoresist which has no compatibility to organic materials. However, semi-perfluoro calixarene, PAG can’t be fully dissolved in fluorous solvent without help of PGMEA solvent. we introduce perfluoro ether type chain to semi calixarene and PAG to give better solubility to HFE solvent. Without the help of PGMEA solvent, we successfully dissolve new calixarene molecule, new PAG in HFE solvent. |
